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PRECURSOR SOLUTIONS OF SILICONE COPOLYMER MATERIALS MADE FROM A SILOXANE CONTAINING A BIS-AMINO ARYL ETHER OF A BIS-AMINO THIO ETHER IN DIALKYL ETHERS OF CONDENSED POLYETHLENE GLYCOLS
PRECURSOR SOLUTIONS OF SILICONE COPOLYMER MATERIALS MADE FROM A SILOXANE CONTAINING A BIS-AMINO ARYL ETHER OF A BIS-AMINO THIO ETHER IN DIALKYL ETHERS OF CONDENSED POLYETHLENE GLYCOLS
BA0004PRECURSOR SOLUTIONS OFSILICONE COPOLYMER MATERIALS MADE FROMA SILOXANE CONTAINING A BIS-AMINO ARYL ETHEROF A BIS-AMINO THIO ETHER IN DIAIKLY ETHERSOF CONDENSED POLYETHYLENE GLYCOLSAbstractA precursor solution of a copolymer material whichis the product of the condensation reaction of an organicdiamine with a siloxane containing a bis-amino aryl ether orbis-amino aryl thioether with molar amounts of an organicdianhydride in a solvent which is at least one selected fromthe group consisting of monoalkyl ethers of ethylene glycol,monoalkyl ethers of condensed polyethylene glycol, dialkylethers of ethylene glycol, dialkyl ethers of condensed poly-ethylene glycol and cyclic ethers containing no less than a5 member ring is suitable for use as a wire coating, passi-vation and/or protective coating for semiconductor devicesand the like. A part or all of the organic diamine may bea macrocyclic crown ether which enables the copolymer mat-erial to have a chemically bonded chelant embodied therein.The copolymer material of the precursor solution may be ofa block type configuration, a random type configuration, orboth, and either may be cured at a low temperature such as75°C when the solvent is diglyme.Inventor: Abe Berger
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