IMAGE FORMATION PROCESS USING A POSITIVE RESIST COMPOSITION CONTAINING A FILM FORMING MATERIAL HAVING A SUBSTITUTED BENZOIN GROUP IN THE CHAIN BACKBONE

摘要

Case 3-13266/ARL 305+- 1 -IMAGE FORMATION PROCESSABSTRACT OF THE DISCLOSUREA method for forming an image by a positive resist processcomprises(1) exposing imagewise to actinic radiation a photoresistcomposition comprising(a) a film-forming organic material having at least onesubstituted benzoin group of formula IwhereR1 denotes a hydrogen atom, an alkyl, cycloalkyl, cycloalkylalkyl,or aralkyl group or a group -(CH2)bX; R2 denotes a hydrogen atomor an alkyl, cycloalkyl, cycloalkylalkyl, aryl or aralkyl group;R3 denotes a halogen atom or an alkyl, alkoxy, cycloalkyl,cycloalkylalkyl or phenyl group; X denotes a halogen atom, analkoxy group, a phenoxy group, a group -COOR4 or a group -OOCR4,where R4 denotes an alkyl group; a denotes zero or 1; b denotesan integer of from 1 to 4; m and n each denote zero or 1, thesum of m + n being 1; p and q each denote zero or 1, the sum ofp + q being 1; and c and d each denote zero or an integer offrom 1 to 3; and- 2 -(b) a compound which is polymerisable under the influence ofa free radical catalyst to form a higher molecular weight materialwhich is more soluble in a developer than the composition priorto exposure, so that the solubility of the composition in adeveloper is increased in the exposed portion; and(2) treating the composition with a developer to removethe exposed portion.