首页> 外国专利> TREATING LIQUID CIRCULATION MECHANISM FOR COUPLED CHEMICAL TREATMENT APPARATUS

TREATING LIQUID CIRCULATION MECHANISM FOR COUPLED CHEMICAL TREATMENT APPARATUS

机译:耦合化学处理装置的液体循环机理的处理

摘要

PURPOSE:To provide the title circulation mechanism by which sufficient circulation of a chemically treating liquid can be carried out by placing a receiver for the liquid sprayed in two or more chamical treatment apparatus coupled, and feeding the liquid in the receiver to other apparatus through circulation piping owing to a difference in liquid surface. CONSTITUTION:Receiver 9 for chemically treating liquid 2 sprayed 5 is placed in coupled chemical treatment apparatus 1 at a position higher than the surface of liquid 2. Circulation piping 10 is extended from receiver 9 to other coupled apparatus 1 through connection pipe 6. With the constitution, liquid 2 is fed from receiver 9 to apparatus 1 owing to a difference in liquid surface and liquid 2 of the same amt. can be returned through pipe 6. Since spray pump 3 can also be used as a circulation pump, any circulation pump is not required. Piping 10 is all arranged in apparatus 1, and hence the apparatus can be made compact and a liquid leak does not occur.
机译:目的:提供一种标题循环机构,通过该机构可以通过将要喷射的液体的接收器放置在两个或多个化学处理装置中并通过循环将接收器中的液体输送到其他装置中来实现化学处理液的充分循环由于液面不同而导致管道损坏。组成:用于对喷洒的液体2进行化学处理的接收器9被放置在耦合化学处理设备1中高于液体2表面的位置。循环管道10从接收器9穿过连接管6延伸到另一个耦合设备1。在结构上,由于相同的液面和液体2的液面不同,液体2从接收器9被送入装置1。喷射泵3也可以用作循环泵,因此不需要任何循环泵。管道10都布置在设备1中,因此可以使设备紧凑并且不会发生液体泄漏。

著录项

  • 公开/公告号JPS6041981B2

    专利类型

  • 公开/公告日1985-09-19

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;

    申请/专利号JP19770150539

  • 发明设计人 KANEKO MASAO;NOHARA SHOZO;

    申请日1977-12-16

  • 分类号B01J4/00;B01J10/00;C23F1/00;C23F1/08;

  • 国家 JP

  • 入库时间 2022-08-22 08:22:48

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