PURPOSE:To transfer a mask pattern of a large area with high accuracy without the unevenness of exposure by vibrating a radiation bundle, which is reflected by a convex mirror and a sectional area thereof is expanded, by giving the convex mirror a rotation or a rotation-vibration. CONSTITUTION:A section 54', which can uniformly expose a resist film effectively, in synchrotron orbital radiant beams 54 is passed selectively by using a slit 53 of width of W=5mm., and projected to the cylindrical convex mirror 51, and the mirror 51 is rotated and vibrated at amplitude of + or -100rad as shown in the arrow 57 around a shaft 52 on radiant luminous flux 54'a. A range enabling uniform exposure by radiant beams of lambda=1nm is brought to approximately 50mm. width, and expanded up to decuple as wide as width of W=5mm. of incident beams 54'.
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