use of an essentially sio amp; amp; darr; 2 amp; amp; darr; b amp; amp; darr; 2 amp; amp; darr; o amp; amp; darr; 3 amp; amp; darr;, al amp; amp; darr; 2 amp; amp; darr; o amp; amp; darr; 3 amp; amp; darr, mgo and pbo containing glass for a photomaske and additionally, bao and zno containing glass system

摘要

for use as a photomaske for use in the manufacture of integrated circuits is a glass from a sio2 - al2o3 - mgo - b2o3 pbo system with a linear coefficient of expansion (- 107) within an area of about