PHOTOCHEMICAL VAPOR DEPOSITION WITH SYNCHROTRON RADIATION LIGHT

摘要

PURPOSE:To remarkably improve the controllability of reaction as well as to increase the speed of forming films, by employing a synchrotron radiant light as a light source for optical pumping. CONSTITUTION:After a substrate 1 is disposed within a reaction chamber 1, a high vacuum is produced within the chamber by a vacuum means through an exhaust port 5. A required material gas is introduced through a reaction gas inlet port 4, while light radiated by a synchrotron beam port 3 is introduced into the reaction chamber through an optical system 2 and a window 6. The material gas is thus irradiated and excited by the light so as to deposit a reaction product on the substrate 7. The synchrotron-radiated light SOR, which is produced when electrons rotate along the circular track of a high-energy electron synchrotron and an electron storing ring, has a range of wavelengths extending from those of X radiation to those of infrared radiation, and is continuous. Its intensity is therefore is 102-104 times higher than that of a conventional light source. Accordingly, the use of this SOR enables the controllability of the growth of films to be improved remarkably.