首页> 外国专利> METHOD OF DEPOSITION OF UNIFORM, SUBSTRATE-INDEPENDENT METAL LAYERS ON SOLID AND LIQUID MATERIAL SURFACES, AND/OR METAL DEPLETION OF SOLUTIONS

METHOD OF DEPOSITION OF UNIFORM, SUBSTRATE-INDEPENDENT METAL LAYERS ON SOLID AND LIQUID MATERIAL SURFACES, AND/OR METAL DEPLETION OF SOLUTIONS

机译:在固体和液体材料表面上沉积均匀,不需基质的金属层和/或溶液的金属损耗的方法

摘要

The solid or liquid material surfaces are contacted with electrically uncharged metal hydroxides, which saturates said surfaces with a uniform layer independently of their substrate. It is possible, on one hand, to deposit simply and economically uniform layers of any thickness, even monomolecular, and to obtain suspensions and emulsions showing well defined properties and, on the other hand, to eliminate the metals contained in the solutions and waters without loading the soluble phase with additional substances. This method also allows to determine surfaces of suspended complex systems.
机译:固体或液体材料表面与不带电的金属氢氧化物接触,金属氢氧化物使所述表面具有独立于其基底的均匀层。一方面,可以沉积任何厚度甚至单分子的简单且经济的均匀层,并获得表现出明确定义的特性的悬浮液和乳液,另一方面,可以消除溶液和水中所含的金属而无需在可溶相中加入其他物质。该方法还可以确定悬浮的复杂系统的表面。

著录项

  • 公开/公告号WO8605822A1

    专利类型

  • 公开/公告日1986-10-09

    原文格式PDF

  • 申请/专利权人 WEGMUELLER FRITZ;

    申请/专利号WO1986CH00037

  • 发明设计人 WEGMUELLER FRITZ;

    申请日1986-03-24

  • 分类号C23C18/12;C02F9/00;C04B41/50;

  • 国家 WO

  • 入库时间 2022-08-22 07:36:26

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