method for the manufacture of tantalum, tungsten or molybdenum existing layers at low temperatures and use of these layers

摘要

1. A method for the production of layers, consisting of tantalum, tungsten or molybdenum on substrates at low temperatures, wherein the halides of these metals are used as starting materials, which in the presence of silane (SiH4 ) are thermally decomposed and reduced from the gas phase at temperatures 500 C and in the pressure range of 25 Pa to 11x10**3 Pa.