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MIKROPLASTSTRUKTURER, FOERFARANDE FOER ATT BILDA SAODANA STRUKTURER OCH FOTOELEKTRISK MASK LAEMPLIG ATT ANVAENDAS I SAODANT FOERFARANDE.
MIKROPLASTSTRUKTURER, FOERFARANDE FOER ATT BILDA SAODANA STRUKTURER OCH FOTOELEKTRISK MASK LAEMPLIG ATT ANVAENDAS I SAODANT FOERFARANDE.
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机译:微塑性结构,形成苏达纳结构的程序和适用于此类产品的光电子面膜。
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摘要
Microplastic structures, thermally stable up to at least 200 deg.C are produced by (a) coating a substrate with a photosensitive compsn. contg. 40-99.9 wt.% crosslinkable polymer and 0.1-60 wt.% photoacid generator, (b) exposing the coating through one or more photomasks to light, (c) heating to 70-120 deg.C to crosslink the exposed coating(s), and (d) removing portions of the coating with an aq. base soln. Pref. the microplastic structure is in the positive or negative mode and the coating is exposed to a near UV light source. The compsn. pref. contains (i) 3-50 wt.% aminoplast, 90-40 wt.% of reactive H-contg. cpd. and 2-30 wt.% photoacid generator sensitive to near UV light or (ii) 50-95 wt.% phenoplast, 40-3 wt.% HCHO generating cpd. and 2-30 wt.% photoacid generator sensitive to near UV light, (iii) 95.99.9 wt.% acid-hardening resin, 0.1-5 wt.% photoacid generator sensitive to deep UV light at an exposure dosage of 10Mj/sq.cm.
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