The polymer composition sensitive to the application or to the radiation, its use in order to form the drawings, in relief, and compounds used in this composition

摘要

Polymer composition sensitive to the application or to the radiation, its use in order to form the drawings, in relief, and compounds used in this composition. / p & & p & the polymer composition sensitive to the application or to the radiation, comprises a poly (amic acid) having, as main component, a unit repetitive of formula: & br / (see appended drawing in bopi) & br / b one or more compounds which are sensitive to the application or to the radiation, comprising an amino group and an aromatic group, azide or an aromatic group sulfonylazide in its molecule, and if necessary, one or several photosensitizers and or amine compounds containing at least one unsaturated, and or of one or more compounds comprising at least two links unsaturated ketones in their molecule, the said composition being extremely sensitive to the application and the radiation and which can give a relief pattern national on a substrate. In addition, the polyimide film finally obtained has an excellent resistance to heat. / p & & p & use of this composition for the manufacture of the drawings, in relief on a support.