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Method of forming an iron oxide film by reacting sputtering with control of a glow discharge by monitoring an emission spectrum of iron from the glow discharge
Method of forming an iron oxide film by reacting sputtering with control of a glow discharge by monitoring an emission spectrum of iron from the glow discharge
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机译:通过监视辉光放电中的铁的发射光谱,通过使溅射与辉光放电控制反应来形成氧化铁膜的方法
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摘要
In a method of forming an iron oxide film of either Fe.sub.3 O. sub.4 or &agr;-Fe.sub.2 O.sub.3 on a substrate with reactive sputtering of a target of iron, intensity of an emission spectrum of iron is previously determined as a predetermined value in connection with a desired one of Fe.sub.3 O.sub.4 and &agr;-Fe.sub.2 O.sub.3 films. A light beam emitted from the glow discharge is measured to produce an electric signal representative of intensity of a measured spectrum of iron. Control operation is carried out to adjust the measured spectrum to the predetermined value. The electric signal may control either a flow rate of introducing oxygen gas into the space or intensity of an electric field produced between the substrate and the target.
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机译:在通过铁靶的反应溅射在基板上形成Fe 3 O 4或α-Fe 2 O 3的氧化铁膜的方法中,预先结合Fe 3 O 4和α-Fe 2 O 3薄膜中所需的一种将铁的发射光谱确定为预定值。测量从辉光放电发射的光束以产生代表所测铁谱强度的电信号。进行控制操作以将测得的光谱调节到预定值。电信号可以控制将氧气引入空间的流速或在基板和靶之间产生的电场强度。
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