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MASS MEASURING INSTRUMENT FOR HETEROGENEOUS MATERIAL ON BASE MATERIAL BY BETA RAY

机译:基于β射线的基础材料异质材料质量检测仪

摘要

PURPOSE:To reduce the size of an instrument and to take measurement without destroying a raw material by uniting and storing a beta-ray radiation source and an annular semiconductor detector in a container. CONSTITUTION:The beta-ray source 1 is fitted behind the annular Si semiconduc tor detector 2 and they are united and stored in the lead container 3. The intensi ty of the beta-ray source 1 may be, for example, =100 microcurie. A primary beta ray 4 is projected on a base material 7 from the beta-ray source 1. If there is a heterogeneous material 6 on the base material 7, the beta ray is absorbed corresponding to its amount and backward-scattered beta ray 5 is scattered. The backward-scattered beta ray 5 is detected by the detector 2 to find the mass of the heterogeneous material 7. Thus, the radiation source and annular semiconductor are united, so the instrument is reduced in size, measurement is taken even in a narrow place, and the coating film on the base material, oxide layer of an iron plate, etc., can be measured effectively.
机译:目的:通过将β射线辐射源和环形半导体检测器组合并存储在容器中,以减小仪器的尺寸并在不破坏原材料的情况下进行测量。组成:β射线源1安装在环形硅半导体探测器2的后面,并被组合并存储在铅容器3中。β射线源1的强度例如可以是<= 100微居里。初级β射线4从β射线源1投射到基础材料7上。如果在基础材料7上存在异质材料6,则β射线会吸收相应的数量,并且向后散射的β射线5会被吸收。疏散。由检测器2检测到向后散射的β射线5,以找到异质材料7的质量。因此,辐射源和环形半导体结合在一起,因此减小了仪器的尺寸,即使在狭窄的地方也可以进行测量,可以有效地测定基材上的涂膜,铁板的氧化层等。

著录项

  • 公开/公告号JPS63118642A

    专利类型

  • 公开/公告日1988-05-23

    原文格式PDF

  • 申请/专利权人 MARUE HOKUSEI SHOJI:KK;

    申请/专利号JP19860095550

  • 发明设计人 EGUCHI KAN;AMAMIYA SUSUMU;

    申请日1986-04-23

  • 分类号G01B15/02;G01N23/203;

  • 国家 JP

  • 入库时间 2022-08-22 07:08:12

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