DIVIDING METHOD OF FIGURE BY EXPOSING IN ELECTRON BEAM RADIATION

摘要

PURPOSE:To improve productivity and quality of pattern, in the case of presence of a side which is shorter than the minimum tolerable length of unit side of a figure to be drawn, by forming a dividing course by extending this short side. CONSTITUTION:When forming a pattern using electron beam, a figure pattern to be formed is divided into a basic figure of rectangular or trapezoidal shape, etc. or into a drawing unit fugure. At this time, if any one of the sides constituting a figure pattern proved to be shorter than the minimum tolerable length epsilon as unit side of a figure to be drawn, this short side is extended to provide dividing courses AB, BD and DF, etc., and the figure pattern to be formed is divided by the dividing courses. It is possible, by doing so, to reduce number of electronic beam shorts, improve productivity, equalize the beam area and quality of pattern.