首页> 外国专利> METHOD FOR CONDITIONING DIELECTRIC SUBSTRATE FOR PLATING FROM ELECTROLESS PLATING BATH

METHOD FOR CONDITIONING DIELECTRIC SUBSTRATE FOR PLATING FROM ELECTROLESS PLATING BATH

机译:从无电电镀浴中调配用于电镀的电介质的方法

摘要

A dielectric substrate is conditioned for plating from an electroless metal plating bath by providing the surface or surfaces of the substrate that are to be plated with semiconductor material whereby the semiconductor material, in the case of n-type material, exhibits energy band where the valence band is equal to or higher than and, in the case of p-type material, exhibits energy band where the valence band is equal to or lower than the redox potential of the metallic ions in the electroless plating bath that are to be deposited as metal on the substrate.
机译:通过为要电镀的衬底的一个或多个表面提供半导体材料,对介电衬底进行调理,使其可从化学镀金属中进行电镀,从而在n型材料的情况下,半导体材料表现出能带,在价带处能带等于或高于p型材料,并且在能带处的价带等于或低于将作为金属沉积的化学镀浴中金属离子的氧化还原电势在基材上。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号