process for the manufacture of a halfgeleiderinrichting, which made the halfgeleiderlichaam halfgeleiderlichaam with a layer of glasmateriaal provided.which is equipped with a window, is subjected to a heat treatment at a temperature such that the glasmateriaal is brought to flow.

摘要

In a process for producing a semiconductor device having a protecting glass film containing an impurity of a first conductivity type, a masking film is formed on the surface of at least a portion of a region of a second conductivity type opposite to the first conductivity type, this region being within a semiconductor substrate. The masking film is not etched by an etching agent for the protecting glass film and prevents the impurity issuing out of the protecting glass film from entering into the region when the surface of the protecting glass film is smoothed by heating it. After the heating treatment the masking film is at least partly removed to make the window for an electrode contact to the region of the second conductivity type.