首页> 外国专利> Screened photogravure printing method - includes sequential exposure of photosensitive material through gravure screen, positive screen and diffusion sheet

Screened photogravure printing method - includes sequential exposure of photosensitive material through gravure screen, positive screen and diffusion sheet

机译:丝网照相凹版印刷方法-包括通过凹版丝网,正版丝网和扩散片对感光材料进行顺序曝光

摘要

The screened photogravure method uses a positive screen. A photosensitive material is exposed to a light through a photogravure screen. This screen has the required number of crossed transparent lines. The photosensitive material is then exposed to the light through the positive screen. The photosensitive material is exposed to the light after inserting a diffusion sheet between the positive screen and the photosensitive material. The fabrication of the plate or negative is then carried out.
机译:丝网照相凹版印刷法使用正版丝网印刷。光敏材料通过照相凹版印刷机曝光。该屏幕具有所需数量的透明十字线。然后,光敏材料通过正屏幕曝光。在正屏幕和光敏材料之间插入扩散片后,光敏材料暴露在光线下。然后进行印版或底片的制造。

著录项

  • 公开/公告号SE455177B

    专利类型

  • 公开/公告日1988-06-27

    原文格式PDF

  • 申请/专利权人 TOPPAN PRINTING CO LTD;

    申请/专利号SE19770006601

  • 发明设计人 Y * KAMEYAMA;

    申请日1977-06-07

  • 分类号B41C1/00;G03F5/00;

  • 国家 SE

  • 入库时间 2022-08-22 06:58:32

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