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Control of the hydrogen bonding in reactively sputtered amorphous silicon
Control of the hydrogen bonding in reactively sputtered amorphous silicon
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机译:反应溅射非晶硅中氢键的控制
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摘要
A reactively sputtered photoconductive amorphous silicon film having a controlled monohydride and polyhydride bond density is produced by applying a voltage bias to the film's substrate (14) during reactively sputtering a layer of amorphous silicon in a partial pressure of hydrogen.
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