METHODS FOR APPLYING SIMULTANEOUSLY ON A PLURALITY OF INTEGRATED CIRCUIT BOARDS A FILM HAVING A UNIFORM THICKNESS AND CONSISTING OF ARSENIC OR GERMANIUM SELENIDE GLASS SENSITIZED BY A SILVER SALT

摘要

Methods for simultaneously applying a plurality of integrated circuit chips a photosensitive film of uniform thickness in germanium selenide glass or arsenic sensitized with a silver salt. A device according to the invention comprises a reactor (1) chemical vapor deposition assisted by plasma, which is connected to a vacuum pump (4) and a gas distribution plate (6) which is connected on bottles ( 7, 8, 9) respectively containing nitrogen, hydrogen selenide and germane. The reactor (1) comprises a carriage (13) carrying pairs of graphite plates (15a, 15b) which are connected to a generator (17) of oscillating voltage. the silicon wafers (18) are laid against the electrodes (15a, 15b). One application is the manufacture of complex integrated circuits.