首页> 外国专利> LOW SIDELOBE SOLID STATE ARRAY ANTENNA APPARATUS AND PROCESS FOR CONFIGURING AN ARRAY ANTENNA APERTURE

LOW SIDELOBE SOLID STATE ARRAY ANTENNA APPARATUS AND PROCESS FOR CONFIGURING AN ARRAY ANTENNA APERTURE

机译:低旁瓣固态阵列天线装置和配置阵列天线孔径的过程

摘要

An apparatus antenna semiconductor array low sidelobe radiation comprises a large aperture radiation divided into a large number N, small closely spaced radiating apertures, each small radiating aperture being associated with a radiating element and a semiconductor power module linearly polarized. The large radiating aperture is divided into M, preferably between 3 and about 10 concentric radiation areas of elliptical shape and of different dimensions, superposed on each other, for purposes of analysis. Each of these areas has an output voltage amplitude Ei, and semi-major and respective lengths of semi-minor axis, ai and bi, each zone being considered separately in the equation of far field G (, PHI) = [ f (, PHI) (a cos PHI - AG (F) sin PHI cos)] 2, wherein f (, PHI) = (I), ui = (II), J1 (ui) is the Bessel function of the first order, and APHI are unit vectors in the spherical coordinate and Ko is the wave number associated with the radiation field. Using the equation of the far field, the values ​​of Ei, ai and bi for each area are calculated, whereby a peak gain of lateral lobe of the far field which is a minimum or a number specific dB, for example at least 30dB below the gain of the main lob of the far field. The values ​​of Ei in the overlapping areas are aditionnées to establish the voltage amplitude required of the underlying power modules associated with the N radiation openings.
机译:装置天线半导体阵列的低旁瓣辐射包括被分成大量N的大孔径辐射,小的紧密间隔的辐射孔径,每个小辐射孔径与辐射元件和线性极化的半导体功率模块相关联。为了分析的目的,将大的辐射孔分成M个,优选地在3个和大约10个之间的椭圆形且尺寸不同的同心辐射区域上彼此重叠,该M个辐射区域彼此重叠。这些区域中的每个区域都有一个输出电压幅度Ei,以及半短轴和半短轴的相应长度ai和bi,每个区域在远场G(,PHI)= [f(,PHI) )(a cos PHI-AG(F)sin PHI cos)] 2,其中f(,PHI)=(I),ui =(II),J1(ui)是一阶的Bessel函数,而APHI是球坐标系中的单位矢量,Ko是与辐射场关联的波数。使用远场方程,计算每个区域的Ei,ai和bi值,从而使远场旁瓣的峰值增益为最小值或特定数字的dB,例如至少30dB低于远场主瓣的增益。重叠区域中Ei的值是确定与N个辐射孔相关的基础电源模块所需电压幅度的附加条件。

著录项

  • 公开/公告号EP0275303A1

    专利类型

  • 公开/公告日1988-07-27

    原文格式PDF

  • 申请/专利权人 HUGHES AIRCRAFT COMPANY;

    申请/专利号EP19870905342

  • 发明设计人 LEE JAR JUEH;TANG RAYMOND;

    申请日1987-07-21

  • 分类号H01Q21/06;H01Q21/00;H01Q21/22;

  • 国家 EP

  • 入库时间 2022-08-22 06:54:59

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