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Method of producing high T.sub.c superconducting NbN films
Method of producing high T.sub.c superconducting NbN films
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机译:制备高Tc超导NbN薄膜的方法
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摘要
Thin films of niobium nitride with high superconducting temperature (T. sub.c) of 15.7° K. are deposited on substrates held at room temperature (˜90° C.) by heat sink throughout the sputtering process. Films deposited at P.sub.Ar 12.9.+-.0.2 mTorr exhibit higher T.sub.c with increasing P.sub.N2,I, with the highest T.sub. c achieved at P.sub.N2,I =3.7.+-.0.2 mTorr and total sputtering pressure P. sub.tot =16.6.+-.0.4. Further increase of N.sub.2 injection starts decreasing T.sub.c.
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机译:在整个溅射过程中,通过散热器将具有15.7°K的高超导温度(T.sub.c)的氮化铌薄膜沉积在保持在室温(〜90°C)的基板上。 PAr> 12.9 +-。0.2 mTorr时沉积的薄膜随着PN2,I的增加显示更高的Tc,而T2最高。在P N2下达到c,I = 3.7±0.2mTorr,总溅射压力P tot = 16.6±0.4。 N 2注入的进一步增加开始降低T c。
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