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PRODUCTION OF HIGH-PURITY OXYGEN-FREE COPPER

机译:生产高纯度无氧铜

摘要

PURPOSE:To easily remove an element such as S which is the most difficult to remove among impurities with less repetitions by adding an element capable of forming a compd. with S, etc., to the base material to be electrically refined. CONSTITUTION:Oxygen-free copper having relatively high purity and contg. =100ppm impurities is selected as the raw material. An element capable of forming a compd. especially with S or with the Se, As, and P having the properties analogous to those of S is added by =200ppm in total to the oxygen-free copper. As a result, the elements combine with the S and other analogous elements in the raw material to form their compds. which are deposited. When electrolytic refining is carried out under such conditions, the deposits are easily separated by the electrolysis, and high-purity oxygen-free copper can be obtained with less repetitions.
机译:目的:通过添加能够形成复合物的元素,轻松去除杂质中最难去除的元素(如S)。用S等,对基材进行电精制。组成:无氧铜,具有较高的纯度和连续性。选择≤100ppm的杂质作为原料。能够形成补偿的元素。尤其是对于S或具有与S相似性质的Se,As和P,总计合计<= 200ppm地添加到无氧铜中。结果,这些元素与原料中的S和其他类似元素结合形成它们的混合物。存放。当在这种条件下进行电解精制时,沉积物容易通过电解分离,并且可以以较少的重复获得高纯度的无氧铜。

著录项

  • 公开/公告号JPH01263289A

    专利类型

  • 公开/公告日1989-10-19

    原文格式PDF

  • 申请/专利权人 HITACHI CABLE LTD;

    申请/专利号JP19880090572

  • 发明设计人 NAGAI YASUMUTSU;SAKAI SHUJI;

    申请日1988-04-13

  • 分类号H01L21/60;C25C1/12;

  • 国家 JP

  • 入库时间 2022-08-22 06:46:30

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