首页> 外国专利> TREATMENT SYSTEM FOR WASTE WATER OF POLISHING OF SILICON WAFER

TREATMENT SYSTEM FOR WASTE WATER OF POLISHING OF SILICON WAFER

机译:硅片抛光废水处理系统

摘要

PURPOSE:To improve the capacity to treat waste water by providing a dehydrator to dehydrate the water in the waste water and connecting a 1st waste water system contg. fine silicon powder and a 2nd waste water system separated and isolated therefrom to the dehydrator in such a manner that the systems can be selected via a pump. CONSTITUTION:Milk 1a of lime formed by, for example, an oxygen waste water treatment in the waste water system 1 is introduced by a press feed pump 3 by opening a selector valve 2 and is fed into the dehydrator 4 by which the milk of lime layer is formed to several millimeter thickness on the filter cloth surface of the dehydrator 4. The waste water 5a contg. the fine silicon powder in the waste water system 5 is fed through the pump 3 into the dehydrator 4 by opening a selector valve 6 upon lapse of the prescribed time and is thereby treated. Since the fine silicon powder does not come into contact with the filter cloth at this time, the filter cloth is hardly clogged. The milk 1a of lime is again fed into the dehydrator in the final of the stage, by which the piping is substd. with the milk of lime and the danger of hydrogen generation, etc., is averted.
机译:目的:通过提供一个脱水器来对废水中的水进行脱水并连接一个第一废水系统,以提高处理废水的能力。细硅粉和与之分离并与脱水器分离的第二废水系统的方式使得可以通过泵选择系统。组成:例如,通过在废水处理系统1中进行氧气废水处理而形成的石灰乳1a,通过打开换向阀2由压力进料泵3引入,并被馈送到脱水器4中,石灰乳由此而来在脱水器4的滤布表面上形成几毫米厚的水层。废水5a连续。在经过规定的时间后,通过打开选择阀6,将废水系统5中的细硅粉通过泵3送入脱水器4,并进行处理。由于此时细硅粉不与滤布接触,因此滤布几乎不被堵塞。在该阶段的最后阶段,再次将石灰乳1a进料到脱水器中,由此对管道进行置换。避免了石灰乳和产生氢气的危险等。

著录项

  • 公开/公告号JPS6422391A

    专利类型

  • 公开/公告日1989-01-25

    原文格式PDF

  • 申请/专利权人 NEC KYUSHU LTD;

    申请/专利号JP19870177743

  • 发明设计人 TATEISHI MANABU;

    申请日1987-07-16

  • 分类号B01D37/04;B24B55/03;C02F1/00;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 06:46:05

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