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METHOD FOR EVALUATING NITRIDATION CONDITION OF SINTERED SILICON NITRIDE BODY OBTAINED BY REACTION SINTERING

机译:反应烧结获得的硅氮化物烧结体氮化状态评估方法

摘要

PURPOSE:To easily evaluate the nitridation conditions of a sintered silicon nitride body obtd. by reaction sintering by the correlative relations between the CT values in the respective parts of the sintered silicon nitride body by an industrial x-ray CT scanner as well as the nitridation rates and treatment temps. by a powder X-ray diffraction method. CONSTITUTION:A sample after a calcination treatment for nitridation is subjected to tomography by the industrial X-ray scanner and the CT values are measured by image processing. An increase in the CT value and an increase in the nitridation rate, i.e., an increase in the amt. of the nitride to be formed correspond well to each other if the nitridation rate of the sample at the prescribed treatment temp. is determined by the powder X-ray diffraction method. The nitridation conditions in the respective parts of the sample are, therefore, easily evaluated by measuring the CT values.
机译:目的:为了容易地评估氮化硅烧结体的氮化条件。通过利用工业X射线CT扫描仪在烧结的氮化硅体的各个部分中的CT值之间的相关关系以及氮化速率和处理温度之间的相关关系,进行反应烧结。通过粉末X射线衍射法。组成:经过氮化处理的煅烧样品经过工业X射线扫描仪进行断层扫描,并通过图像处理测量CT值。 CT值的增加和氮化率的增加,即,amt的增加。如果样品在规定的处理温度下的氮化速率,则要形成的氮化物的相互之间的对应关系很好。通过粉末X射线衍射法测定。因此,可以通过测量CT值轻松评估样品各个部分的氮化条件。

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