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FINISH PROCESSING METHOD FOR SINTERED METAL VIA ELECTROCHEMICAL MACHINING

机译:电化学加工烧结金属的精加工方法

摘要

PURPOSE:To ionize even a parent metal in addition to a bonding material for sintered metal and obtain a glossy surface by supplying pulse current of specific current density between a workpiece and a processing electrode in processing the workpiece comprising sintered metal. CONSTITUTION:An electrolytic product generated by filling a machining fluid free from an electrolytic product between a processed surface 2a and an electrode surface 4a opposing a gap 18 and supplying pulse current, is eliminated and the electrode surface 4a is again made in contact with the processed surface 2a. Processing depth per processing is measured and a value obtainable therefrom is accumulated. The aforementioned process is repeated with a control device 12. The process terminates when the accumulated value reaches within the predetermined difference, compared with a set value calculated by a processing condition control part 10 on the basis of data from an input device 13. When pulse current of low current density is fed in finishing sintered metal, only a metal composition liable to being eluted depending upon ionization tendency is eluted. By supplying the pulse current of current density equal to or above 110A/cm2, surface roughness is improved regardless of the ionization tendency of the metal composition.
机译:目的:在用于烧结金属的工件加工过程中,通过在工件和加工电极之间提供特定电流密度的脉冲电流,使除用于烧结金属的粘结材料之外的母体金属离子化,并获得光滑的表面。组成:消除了通过在加工表面2a和与间隙18相对的电极表面4a之间填充不含电解产物的加工液并提供脉冲电流而产生的电解产物,并再次使电极表面4a与加工过的接触表面2a。测量每次处理的处理深度,并累积从中获得的值。与控制装置12一起重复上述处理。与由处理条件控制部10根据来自输入装置13的数据计算出的设定值相比,在累计值达到规定的差以内时,处理结束。将低电流密度的电流送入精加工的烧结金属中,仅洗脱根据电离趋势易于洗脱的金属组合物。通过提供电流密度等于或大于110A / cm 2的脉冲电流,与金属组合物的电离趋势无关地改善了表面粗糙度。

著录项

  • 公开/公告号JPS6434610A

    专利类型

  • 公开/公告日1989-02-06

    原文格式PDF

  • 申请/专利权人 SHIZUOKA SEIKI CO LTD;

    申请/专利号JP19870191136

  • 发明设计人 ASAOKA TERUO;KUWABARA YOHEI;

    申请日1987-07-30

  • 分类号B23H3/00;B23H3/02;

  • 国家 JP

  • 入库时间 2022-08-22 06:43:10

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