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SECOND HARMONIC WAVE INTENSITY MODULATING SYSTEM

机译:二次谐波强度调制系统

摘要

PURPOSE:To modulate second harmonic wave intensity at a high speed by projecting laser light to an org. nonlinear optical element having a Pockels effect to generate the second harmonic waves and applying an electric field thereto to change the refractive index, thereby modulating the intensity of the second harmonic waves. CONSTITUTION:The laser light is projected to the org. nonlinear optical element 1 which generates the second harmonic waves by the light of a laser light source and has the Pockels effect to generate the second harmonic waves. The electric field is impressed by a power supply 2 to the medium 1 to change the refractive index by the Pockels effect. The intensity of the second harmonic waves is modulated in such a manner. The intensity modulation of the second harmonic waves is thus executed and in addition, the modulation at the extremely high speed is possible.
机译:目的:通过将激光投射到组织上来高速调制二次谐波强度。具有普克尔斯效应的非线性光学元件,用于产生二次谐波并对其施加电场以改变折射率,从而调制二次谐波的强度。组成:激光被投射到组织。非线性光学元件1,其通过激光源的光产生二次谐波并具有普克尔斯效应以产生二次谐波。电场由电源2施加到介质1,以通过普克尔斯效应改变折射率。以这种方式调制第二谐波的强度。因此执行二次谐波的强度调制,并且此外,可以以极高的速度进行调制。

著录项

  • 公开/公告号JPS643633A

    专利类型

  • 公开/公告日1989-01-09

    原文格式PDF

  • 申请/专利权人 RICOH CO LTD;

    申请/专利号JP19870157491

  • 申请日1987-06-26

  • 分类号G02F1/01;G02F1/35;G02F1/355;G02F1/361;G02F1/37;

  • 国家 JP

  • 入库时间 2022-08-22 06:40:58

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