Linearly structured multiple aperture and beam blanking electrodes for the production of a multiplicity of individually blankable corpuscular beam probes in a lithography apparatus

摘要

1. Diaphragm with linear multiple-aperture structure and beam blanking electrodes for the production of a multiplicity of individually blankable corpuscular beam probes for a lithography apparatus, having a corpuscular beam source (1), a condenser lens system (2, 3), a beam blanking diaphragm (5) and an optical imaging system (6, 7, OL), characterized in that the diaphragm (4) consists of a highly resistive substrate, especially silicon or silicon dioxide, on which the beam blanking electrodes are applied in a plane oriented perpendicular to the beam direction, in the form of conductor webs (21, 23, AE, 27), which are provided with connections (24, 26) for the supply of beam blanking voltages.