首页> 外国专利> Integrated circuit in complementary circuit technology comprising a substrate bias voltage generator and a Schottky diode

Integrated circuit in complementary circuit technology comprising a substrate bias voltage generator and a Schottky diode

机译:互补电路技术中的集成电路,包括衬底偏置电压发生器和肖特基二极管

摘要

An integrated circuit in complementary circuit technology comprising a substrate bias voltage generator which applies a negative (positive) substrate bias voltage to the p(n) substrate in which n(p) tubs are inserted. The source regions of the n(p)-channel FETs arranged in the substrate lie at ground potential. In order to avoid "latch-up" effects, an output of the substrate bias voltage generator is connected via a Schottky diode to a circuit point that lies at ground potential.
机译:互补电路技术中的集成电路,包括衬底偏置电压发生器,该衬底偏置电压发生器将负(正)衬底偏置电压施加到其中插入了n(p)个桶的p(n)衬底。布置在基板中的n(p)沟道FET的源区位于地电位。为了避免“闩锁”效应,衬底偏置电压发生器的输出通过肖特基二极管连接到位于地电位的电路点。

著录项

  • 公开/公告号US4807010A

    专利类型

  • 公开/公告日1989-02-21

    原文格式PDF

  • 申请/专利权人 SIEMENS AKTIENGESELLSCHAFT;

    申请/专利号US19860895313

  • 发明设计人 JOSEF WINNERL;DEZSO TAKACS;

    申请日1986-08-11

  • 分类号H01L29/48;H01L29/78;H01L27/02;H01L23/48;

  • 国家 US

  • 入库时间 2022-08-22 06:28:32

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