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Baths and process for electroplating hard,adherent,smooth, wear resistant and corrosion resistant chromium deposits
Baths and process for electroplating hard,adherent,smooth, wear resistant and corrosion resistant chromium deposits
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机译:电镀硬,附着,光滑,耐磨和耐腐蚀铬镀层的镀液和工艺
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摘要
Corrosion resistant electrodeposited chromium layers, processes for their electrodepositions and plating baths suitable for use therein are disclosed. The corrosion resistant chromium layers also are bright, adherent, smooth, hard, wear resistant, and exhibit a low coefficient of friction. Electrodeposition is carried out at both high and low currrent densities. The baths used comprise 450-650 g/l of chromic acid, 40-100 g/l of sulfoacetic acid and 0-4.5 g/l of sulfate ion and are substantially free of other carboxylic acids, fluoride ions, iodide ions, bromide ions and selenium ions. The baths used comprise 400- 650 g/l of chromic acid, 40-100 g/l of sulfoacetic acid and 0-4.5 g/l of sulfate ion and are substantially free of other carboxylic acids, flouride ions, iodide ions, bromide ions and selenium ions.
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机译:公开了适用于其中的耐腐蚀电沉积铬层,其电沉积方法和镀浴。耐腐蚀铬层还具有光亮,附着力,光滑,坚硬,耐磨和低摩擦系数的特点。电沉积在高和低电流密度下进行。所使用的浴液包含450-650 g / l的铬酸,40-100 g / l的磺基乙酸和0-4.5 g / l的硫酸根离子,并且基本上不含其他羧酸,氟离子,碘离子,溴离子和硒离子。所使用的浴液包含400-650 g / l的铬酸,40-100 g / l的磺基乙酸和0-4.5 g / l的硫酸根离子,并且基本上不含其他羧酸,氟离子,碘离子,溴离子和硒离子。
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