This invention relates to the preparation of a novel Si/HZSM-5 catalyst through vapor phase deposition of Si on the surface of HZSM-5 catalyst which is obtained by ion exchanging ZSM-5 catalyst. The source of depositing Si comes from tetraalkyl ortho-silicate (or tetra-alkoxy silane), Si(OR)4, wherein R represents the alkyl group that contains 1-4 carbon atoms. The silicon deposit will substantially not clog the pores of the catalyst.PPThe present invention is to make use of the modified catalyst in the alkylation or disproportionation reactions in order to enhance the yield of p-dialkylbenzene as an ingredient in the final product of aryl compounds such as toluene or ethylbenzene.
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