首页> 外国专利> METHOD FOR MEASURING VELOCITY DISTRIBUTION OF PARTICLE AND CONTROLLING METHOD FOR PROCESS BASED ON VELOCITY DISTRIBUTION OF PARTICLE

METHOD FOR MEASURING VELOCITY DISTRIBUTION OF PARTICLE AND CONTROLLING METHOD FOR PROCESS BASED ON VELOCITY DISTRIBUTION OF PARTICLE

机译:粒子速度分布的测量方法及基于粒子速度分布的过程控制方法

摘要

PURPOSE:To accurately measure velocity distribution of particles and to enhance the quality of a formed film by irradiating the flying particles generated in a film forming process with laser beams from the three-dimensional directions and measuring the three-dimensional velocity vector components of the flying particles. CONSTITUTION:Gaseous Ar 504 is introduced between a target 502 and a base plate 501 and high voltage is impressed by a DC power source 503 to form plasma. The positive ions of the gaseous Ar 504 are allowed to collide against the target 502 and the beaten-out target atoms are deposited on the base plate 501. At this time, for example Fe is utilized for the target 502 and the pressure of gaseous Ar is regulated to about 50 mTorr and DC power source voltage is regulated to about 3kV and laser beams L1-L3 are wholly set at about 302.064nm wavelength. Laser wavelength is successively scanned in a measuring region in a range of about 1nm from the laser beams L1-13. Fluorescence generated at this time is successively measured by a detector 509. The mean value of velocity vector of the particles incident on the base plate 501 is calculated from these three fluorescence intensity distributions by a personal computer 510 and a process is controlled on the basis thereof.
机译:目的:通过用三维方向的激光束照射成膜过程中产生的飞散颗粒,并测量飞散的三维速度矢量分量,来精确测量颗粒的速度分布并提高成膜质量。粒子。组成:将气态Ar 504引入靶502和基板501之间,并且直流电源503施加高电压以形成等离子体。允许气态Ar 504的正离子与靶材502碰撞,被击打的靶材原子沉积在基板501上。这时,例如Fe被用作靶材502和气态Ar的压力将激光束L1-L3调节至约50mTorr,将直流电源电压调节至约3kV,并且将激光束L1-L3整体设置为约302.064nm波长。在距激光束L1-13约1nm范围内的测量区域中连续扫描激光波长。这时产生的荧光由检测器509连续地测量。入射到基板501上的颗粒的速度矢量的平均值由个人计算机510从这三个荧光强度分布中计算出,并基于此来控制处理。 。

著录项

  • 公开/公告号JPH02247381A

    专利类型

  • 公开/公告日1990-10-03

    原文格式PDF

  • 申请/专利权人 FUJITSU LTD;

    申请/专利号JP19890068624

  • 申请日1989-03-20

  • 分类号G01T1/36;C23C14/54;H01L21/203;H01L21/302;H01S3/00;

  • 国家 JP

  • 入库时间 2022-08-22 06:22:51

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