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Ekikagasuteiryochunyusochi

机译:液化气低露注入措施

摘要

PURPOSE:To enable to inject the constant volume of active gas in a high speed continuously by a method wherein a control device for supplying the liquefied gas, which keeps the height of the level of the liquefied gas at a predetermined position, is utilized. CONSTITUTION:A valve opening and closing device 8 is operated to drop the constant volume of LN2 gas into a can body 18 from the staying chamber 4 of an injection equipment 1 through an injection nozzle 7. When the position of the level of the gas liquid in the staying chamber 4 descends during the continuous injection motion, a level control device 14 is operated, a pressure regulating valve 26 in a pressurized gas supplying pipeline 25, connecting an N2 gas reservoir 24 and an LN2 gas reservoir 2, is operated to supply the LN2 gas into the staying chamber 4 and the position of the level of the gas liquid is kept at the predetermined position. In this case, the flow of the LN2 gas in the staying chamber 4 is mitigated by a flow mitigating device 17 and, further, swinging of the LN2 gas is restricted by a swing restricting plate 15, thereby stabilizing the outflow of the gas from the injection nozzle 7.
机译:用途:为了能够通过一种方法连续高速地注入恒定体积的活性气体,其中使用了一种将液化气的高度保持在预定位置的用于供应液化气的控制装置。组成:一个阀门打开和关闭装置8,用于将恒定体积的LN2气体通过注射喷嘴7从注射设备1的停留室4滴入罐体18中。在连续喷射运动期间,在滞留室4中下降时,操作液位控制装置14,连接N 2气体储存器24和LN 2气体储存器2的加压气体供应管线25中的压力调节阀26被操作以进行供应。 LN 2气体进入滞留室4,并且气液水平的位置保持在预定位置。在这种情况下,滞留室4中的LN 2气体的流动通过流量减轻装置17被减轻,并且进一步,LN 2气体的摆动被摆动限制板15限制,从而稳定了气体从壁的流出。喷嘴7。

著录项

  • 公开/公告号JPH0227212B2

    专利类型

  • 公开/公告日1990-06-15

    原文格式PDF

  • 申请/专利权人 HOKKAI CAN;

    申请/专利号JP19810179581

  • 发明设计人 SHINHO HIROAKI;SAWAMURA EIJI;

    申请日1981-11-11

  • 分类号F17C6/00;B65B31/00;B65B31/04;F17C13/02;

  • 国家 JP

  • 入库时间 2022-08-22 06:22:31

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