首页> 外国专利> GRAFT COPOLYMER, POLYMER MATERIAL COMPOSITION CONTAINING SAID COPOLYMER AND FOAMABLE POLYSTYRENE BEAD CONTAINING SAID COPOLYMER AND PREPARATION OF SAID BEAD

GRAFT COPOLYMER, POLYMER MATERIAL COMPOSITION CONTAINING SAID COPOLYMER AND FOAMABLE POLYSTYRENE BEAD CONTAINING SAID COPOLYMER AND PREPARATION OF SAID BEAD

机译:接枝共聚物,包含所述共聚物的聚合物材料组合物和包含所述共聚物的易发泡的聚苯乙烯颗粒和所述的制备方法

摘要

PURPOSE:To obtain a graft copolymer having excellent antistat effect and its durability, by copolymerizing a specified hydrophilic monomer and a hydrophobic polymeric monomer having a polymerizable double bond on its terminal. CONSTITUTION:At least one hydrophilic monomer (A) selected from monomers of formulas I, II and III (wherein R1 is H or CH3-; R2 and R3 are each H, CH3 or C2H5; n is 1-5) (e.g., dimethylaminopropyl methacrylamide, dimethylaminopropyl methacrylate, N,N-dimethyl methacrylamide etc.) and a hydrophobic polymeric monomer (B) having a polymerizable double bond on its terminal [e.g., alkyl (meth)acrylates, styrene, acrylonitrile, vinyl acetate, ethylene, propylene etc.] are copolymerized. A graft copolymer providing a polymer material compsn. having especially excellent antistat effect and its durability can be thereby obtd.
机译:目的:通过使特定的亲水性单体和在其末端具有可聚合双键的疏水性聚合物单体共聚,可获得具有优异抗静电作用及其耐久性的接枝共聚物。组成:至少一种选自式I,II和III的单体的亲水性单体(A),其中R 1为H或CH 3-; R 2和R 3各自为H,CH 3或C 2 H 5; n是1-5)(例如,二甲基氨基丙基甲基丙烯酰胺,甲基丙烯酸二甲基氨基丙基,N,N-二甲基甲基丙烯酰胺等)和在其末端具有可聚合双键的疏水性聚合物单体(B)[例如,(甲基)丙烯酸烷基酯,苯乙烯,丙烯腈,乙酸乙烯酯,乙烯,丙烯等]进行共聚。提供聚合物材料的接枝共聚物。具有特别优异的抗静电作用,并且由此可以消除其耐久性。

著录项

  • 公开/公告号JPH01299810A

    专利类型

  • 公开/公告日1989-12-04

    原文格式PDF

  • 申请/专利权人 KANEGAFUCHI CHEM IND CO LTD;

    申请/专利号JP19880128792

  • 发明设计人 AZUMA MASAAKI;TACHIBANA HIROMITSU;

    申请日1988-05-26

  • 分类号C08J9/16;C08F291/00;

  • 国家 JP

  • 入库时间 2022-08-22 06:21:04

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