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POLISHING METHOD FOR ROTATION SYMMETRIC NONSPHERICAL FACE

机译:旋转对称非球面的抛光方法

摘要

PURPOSE:To uniformly polish without spoiling the shape of the surface of the body to be polished by using a resin or rubber with the body to be polished as a matrix and using the replica obtd. by forming by reversing the shape of the surface of the body to be polished by a replica method as a polishing tool. CONSTITUTION:A weir is provided on the outer peripheral end face of the body to be polished with the body 1 to be polished as a matrix and the replica obtd. by casing a resin material is taken as a polishing tool 3. Then the body 1 to be polished and polishing tool 3 are arranged so that their shaft centers coincide, the polishing tool 3 is pressed with an adequate force via an abrasive to the body 1 to be polished and the both are forcibly rotated. For the surface of the body 1 to be polished, the action face of the polishing tool 3 polishes with holding an uniform contact state over the whole face.
机译:目的:通过使用树脂或橡胶将被抛光物体作为基质并使用复制品obtd,进行均匀抛光而不会破坏被抛光物体表面的形状。通过用复制方法作为抛光工具通过反转待抛光物体的表面形状而形成。组成:在待抛光物体的外周端面上设有堰,待抛光物体1为基体,复制品为钝角。通过外壳将树脂材料作为抛光工具3。然后,将要抛光的主体1和抛光工具3布置成使其轴心重合,通过磨料以足够的力将抛光工具3压向主体1。进行抛光,然后将两者都强制旋转。对于待抛光的主体1的表面,抛光工具3的作用面在整个表面上保持均匀的接触状态进行抛光。

著录项

  • 公开/公告号JPH0295557A

    专利类型

  • 公开/公告日1990-04-06

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;

    申请/专利号JP19880241014

  • 发明设计人 KAWAI TSUNEO;

    申请日1988-09-28

  • 分类号B24B13/00;B24B13/02;

  • 国家 JP

  • 入库时间 2022-08-22 06:20:20

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