首页> 外国专利> Method and apparatus for thin film formation using photo-induced chemical reaction

Method and apparatus for thin film formation using photo-induced chemical reaction

机译:利用光致化学反应形成薄膜的方法和设备

摘要

An apparatus for thin film formation using a photo-induced chemical reaction comprises a reaction chamber (2) in which a substrate (1) can be set, means (4) to introduce a reactive gas into the reaction chamber (2) for the purpose of causing a surface of the substrate (1) to adsorb the reactive gas, means (8) to evacuate the reaction chamber (2), means (10) to irradiate the substrate surface having adsorbed the reactive gas with photon energy for the purpose of forming a nucieds required for growing a film on the substrate surface, means (6) to generate metastable excited molecules which can react with the reactive gas to decompose it, and means (3, 5) to introduce the reactive gas and the metastable excited molecules into the reaction chamber (2) for the purpose of growing the film on the substrate (1) formed with the nucleus on the basis of the nucleus.
机译:利用光致化学反应形成薄膜的设备包括:反应室(2),可在其中放置基板(1);装置(4),用于将反应性气体引入反应室(2)为了使基板(1)的表面吸附反应气体,装置(8)排空反应室(2),装置(10)以光子能量照射吸附了反应性气体的基板表面,以达到以下目的:形成在基板表面上生长膜所需的核素,装置(6)产生可与反应性气体反应以分解它的亚稳态激发分子,以及装置(3、5)引入反应性气体和亚稳态激发分子为了使在以核为基础的由核形成的基板(1)上生长膜,将其注入反应室(2)中。

著录项

  • 公开/公告号EP0198361B1

    专利类型

  • 公开/公告日1990-07-18

    原文格式PDF

  • 申请/专利权人 HITACHI LTD.;

    申请/专利号EP19860104633

  • 申请日1986-04-04

  • 分类号C23C16/48;

  • 国家 EP

  • 入库时间 2022-08-22 06:14:34

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号