METHOD AND DEVICE FOR CHEMICAL TREATMENT, PARTICULARLY THERMOCHEMICAL TREATMENT AND CHEMICAL DEPOSITION IN A LARGE VOLUME HOMOGENEOUS PLASMA

摘要

the chemical treatment process, such as heat treatment or plasma chemical deposition on substrates positioned on one or more substrates (15) is characterized by the combination of simultaneous plasma at low pressure, between 1.33 and 000133 pa a self heating, and (3).the plasma is produced by the excitation of a reactive gaseous environment using a filament thermou00e9missif wave or microwave (21, 22), and maintained within the chamber (1) by a magnetic confinement (18), the heater (3) is independent, as can be part of the contents of the enclosure at a temperature equal to or less than about 550oc.the proportion of calories provided by the plasma heating of substrates is negligible.