首页>
外国专利>
A process to produce O-silyl O,N-ketene acetals
A process to produce O-silyl O,N-ketene acetals
展开▼
机译：一种生产O-甲硅烷基O，N-乙烯酮缩醛的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A process for preparing O-silyl O,N-ketene acetals having the formula,R₂C=C(OSiRnX3-n)(NRa₂) or The process comprises contacting an alpha-haloamide with an alkali metal in the presence of an excess of an organohalosilane, the alpha-haloamide having the formula, the organohalosilane having the formula,RnSiX4-n ;and facilitating reaction among the alpha-haloamide, the alkali metal and the organohalosilane to form the O-silyl O,N-ketene acetal and alkali metal halides.
展开▼
机译：具有下式的O-甲硅烷基O，N-乙烯酮缩醛的制备方法：R 2 C = C（OSiR n X 3-n ）（NR a 2）或 <图像文件=“ IMGA0001.GIF” he =“ 12” id =“ ia01” imgContent =“ chem” imgFormat =“ GIF” wi =“ 77” /> 包括在过量的有机卤代硅烷存在下使α-卤代酰胺与碱金属接触，所述α-卤代酰胺具有下式： <图像文件=“ IMGA0002.GIF” he =“ 47” id =“ ia02” imgContent =“ chem” imgFormat =“ GIF” wi =“ 52” /> 有机卤硅烷有公式，R n SiX 4-n ;促进α-卤代酰胺，碱金属和有机卤代硅烷之间的反应，形成O-甲硅烷基O，N-烯酮缩醛和碱金属卤化物。
展开▼
