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Process and apparatus for producing epitaxially and/or highly texturally grown, high TC-oxide superconductor films, lacking in foreign phases, on substrates

机译:在基板上生产外延和/或高度织构生长的,高TC-氧化物超导体薄膜的方法和设备

摘要

The invention relates to a process for producing epitaxially and/or highly texturally grown, high Tc oxide superconductors fibres, with a low foreign phase on substrates, in which process an ablation process is initiated and maintained on a donor target by means of pulsed particle beams or laser beams and small droplets having diameters in the mu m range produced in this process reach the heated substrate, and also to an apparatus for carrying out the process. The object of the invention is to replace the EXIMER laser hitherto used for coating by less expensive and more effective lasers or electron beams. According to the invention, the object is achieved in that the substrate is held at a temperature at which the droplets wet the substrate on impact and solidify to form a uniform, smooth film. An apparatus particularly suitable for carrying out this process comprises an electron source which produces a pulsed electron beam with an electron energy of about 10-20 keV and a current density in the range from 103 to 104 A/cm2. …IMAGE…
机译:本发明涉及一种在基底上具有低异相的,外延和/或高度织构生长的,高Tc氧化物超导体纤维的生产方法,在该方法中,通过脉冲粒子束引发并维持在施主靶上的烧蚀工艺。在该过程中产生的直径为μm范围的激光束和小液滴到达加热的基板,并到达进行该过程的设备。发明内容本发明的目的是用更便宜和更有效的激光或电子束代替迄今为止用于涂层的EXIMER激光。根据本发明,目的在于将基材保持在这样的温度下,在该温度下,液滴在冲击下润湿基材并固化以形成均匀,光滑的膜。特别适合于进行该方法的设备包括电子源,该电子源产生脉冲电子束,该脉冲电子束的电子能量为约10-20keV,电流密度为10 3至10 4 A / cm 2。 2>。 …<图像>…

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