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SHEET GLASS IN MATTERS RELATING TO A DESIGN METHOD FOR SERIOUS AND BURN A DRAWING ON GLASS SUBSTRATE MATERIAL

机译:涉及玻璃基料的严重烧制设计方法的板材

摘要

The invention relates to an article comprising a glass sheet and having an etched pattern, and to a process of manufacturing an article comprising a glass sheet and having an etched pattern. The glass sheet 11 is a chemically tempered glass sheet, and the pattern comprises one or more grooves 10 etched into the article using fluorine ions to a depth of less than 2 mu m. The etched grooves 10 constituting the pattern may be formed in a layer 12 of inorganic material such as SiO2. They may have a width of less than 10 mu m and the spacing (p) between two adjacent grooves may also be less than 10 mu m. The etching may be performed by applying a layer of radiation-sensitive material to at least one face of that sheet and exposing it to radiation to form a latent image of a desired groove pattern, whereafter the radiation-sensitive material is developed to form a resist and the sheet is exposed, through the resist, to the action of fluorine ions in an etching medium to etch the desired groove pattern to a depth of less than 2 mu m. The invention is particularly useful for forming storage discs for recording data and also for forming panels of high optical transmittance.
机译:本发明涉及一种包括玻璃板并具有蚀刻图案的制品,并且涉及一种制造包括玻璃板并具有蚀刻图案的制品的方法。玻璃片11是化学强化玻璃片,并且图案包括一个或多个凹槽10,该凹槽10使用氟离子蚀刻到制品中的深度小于2μm。构成图案的蚀刻槽10可以形成在无机材料例如SiO 2的层12中。它们的宽度可以小于10μm,并且两个相邻的凹槽之间的间隔(p)也可以小于10μm。可以通过在该片材的至少一个面上施加一层辐射敏感材料并将其暴露于辐射下以形成期望的凹槽图案的潜像来进行蚀刻,然后对该辐射敏感材料进行显影以形成抗蚀剂。然后通过抗蚀剂使该片在腐蚀介质中暴露于氟离子的作用,以将所需的凹槽图案腐蚀到小于2μm的深度。本发明对于形成用于记录数据的存储盘以及用于形成高透光率的面板特别有用。

著录项

  • 公开/公告号CH674201A5

    专利类型

  • 公开/公告日1990-05-15

    原文格式PDF

  • 申请/专利权人 GLAVERBEL;

    申请/专利号CH19870004961

  • 发明设计人 HECQ ANDRE;LEDROIT RENE;

    申请日1987-12-18

  • 分类号C03C15/00;C03C17/23;C03C21/00;G03F7/00;G11B7/253;G11B7/26;G11B11/105;

  • 国家 CH

  • 入库时间 2022-08-22 06:11:22

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