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SHEET GLASS IN MATTERS RELATING TO A DESIGN METHOD FOR SERIOUS AND BURN A DRAWING ON GLASS SUBSTRATE MATERIAL
SHEET GLASS IN MATTERS RELATING TO A DESIGN METHOD FOR SERIOUS AND BURN A DRAWING ON GLASS SUBSTRATE MATERIAL
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机译:涉及玻璃基料的严重烧制设计方法的板材
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摘要
The invention relates to an article comprising a glass sheet and having an etched pattern, and to a process of manufacturing an article comprising a glass sheet and having an etched pattern. The glass sheet 11 is a chemically tempered glass sheet, and the pattern comprises one or more grooves 10 etched into the article using fluorine ions to a depth of less than 2 mu m. The etched grooves 10 constituting the pattern may be formed in a layer 12 of inorganic material such as SiO2. They may have a width of less than 10 mu m and the spacing (p) between two adjacent grooves may also be less than 10 mu m. The etching may be performed by applying a layer of radiation-sensitive material to at least one face of that sheet and exposing it to radiation to form a latent image of a desired groove pattern, whereafter the radiation-sensitive material is developed to form a resist and the sheet is exposed, through the resist, to the action of fluorine ions in an etching medium to etch the desired groove pattern to a depth of less than 2 mu m. The invention is particularly useful for forming storage discs for recording data and also for forming panels of high optical transmittance.
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