WAITER DEVELOPER SOLUTION FOR POSITIVELY WORKING PHOTORE RESTS

摘要

The invention relates to an aqueous developer solution for positively acting photoresists and also to a development process. The water-soluble basic compound contained in the developer solution is a compound of the general formula (I): …IMAGE… where R1 to R5 are mutually identical or different and are H, OH, hydroxyalkyl, alkoxy or alkyl. …??They are suitable for the development of positively acting photoresists.