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Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
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机译:制备在碱性显影液中具有降低的溶解速率的重氮醌敏化的聚酰胺酸基光致抗蚀剂组合物的方法
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摘要
The dissolution rate in alkaline developer solutions of image- wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.
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