CONTINUOUS TREATMENT APPARATUS AND POSTERIOR TREATMENT

摘要

PURPOSE:To increase a corrosion-resistant performance of an Al-based interconnection film and a laminated structure interconnection film by a method wherein, after a dry etching treatment of the Al-based interconnection film and the laminated interconnection film, a posterior treatment which is composed of an ashing treatment process and of an adsorption and desorption treatment process of an introduced gas on an object face to be treated is executed continuously. CONSTITUTION:At a posterior treatment, an ashing treatment process to remove a resist is first executed in a treatment chamber 60. Then, a gas (a purer component gas) is supplied into the treatment chamber 60 by using a supply means of a gas for adsorption and desorption treatment use; a pressure control valve 80 to control a pressure inside the treatment chamber 60 is shut; the pressure inside the treatment chamber is increased. Then, when a preset pressure inside the treatment chamber is reached, a supply of the gas for adsorption and desorption treatment use is stopped and the pressure control valve 80 is opened fully. When said operations are executed, a component which has adhered to sidewalls on the surface of an object to be treated is evaporated, adsorbed and desorbed progressively. As a result, a halogen component which has adhered to the object to be treated can be reduced sharply. As a result, a corrosion-resistant performance of an Al-based interconnection film or a laminated structure interconnection film can be increased.