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METHOD OF MAKING QUANTUM WELL STRUCTURE WITH HIGHLY MISMATCHING LATTICE

机译:具有高度匹配晶格的量子阱结构制作方法

摘要

PURPOSE: To obtain a quantum well structure having highly incommensurate lattice by forming a strain free barrier layer and a quantum well structure on an effective substrate provided with a buffer layer and a super lattice structure thereby spatially separating strain in the quantum well structure. CONSTITUTION: A quantum well structure 5 is constituted by growing multiple semiconductor layers sequentially on a substrate 10. At first, a buffer layer 20 of semiconductor material thicker than a critical thickness is grown on the substrate 10 while having lattice incommensurate to that of the substrate 10. A strained superlattice structure 30 is then grown on the buffer layer 20 to obtain an effective substrate 10-20-30 having a modified lattice constant. Subsequently, a quantum well active region 40-50-60 is formed. Incommensurateness of lattice constant between a quantum well layer 50 and a barrier layer 40 is smaller than that between the quantum well layer 50 and the substrate 10. Thereafter, a second superlattice structure 70 is grown on a barrier layer 60 and a cap layer 80 is grown thereon.
机译:目的:通过在具有缓冲层和超晶格结构的有效衬底上形成无应变的势垒层和量子阱结构,从而在空间上分离量子阱结构中的应变,从而获得具有高度不规则晶格的量子阱结构。组成:量子阱结构5是通过在衬底10上依次生长多个半导体层而构成的。首先,在衬底10上生长厚度大于临界厚度的半导体材料的缓冲层20,同时其晶格不等于衬底的晶格。 10.然后在缓冲层20上生长应变超晶格结构30,以获得具有改变的晶格常数的有效衬底10-20-30。随后,形成量子阱有源区40-50-60。量子阱层50与势垒层40之间的晶格常数的不等比小于量子阱层50与基板10之间的晶格常数的不对等。此后,在势垒层60上生长第二超晶格结构70,并且覆盖层80被覆盖。生长在上面。

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