SAMPLE INTRODUCING DEVICE AND METHOD OF INDUCTIVELY COUPLED PLASMA EMISSION ANALYSER

摘要

PURPOSE:To efficiently measure a very small amount of the component in the sample with high accuracy and high sensitivity by covering at least the contact with the sample of a tungsten heater with tantalum reduced in heat capacity and excellent in chemical resistance. CONSTITUTION:A tantalum thin plate 5 is provided to the cavity part 4 of the tungsten heater 3 of a high temp. evaporator 1 and a sample solution is dripped thereon. A heater 3 is heated to the evaporation temp. of the sample solution to dry and ash the sample solution. The vapor of the sample solution is discharged through a four-way clock 6 and, when the heater 3 is heated to high temp. after the cock 6 is changed over to a plasma torch part 8, the ashed sample is evaporated by conduction heat and the radiant heat from the inner wall of the cavity part 4 to be introduced into the plasma 7 of the plasma torch part 8 by argon and hydrogen whose flow rates are controlled by flowmeters 9, 10. Herein, by measuring an excited and emitted spectrum, the content of the impurity in the sample solution is measured. By this constitution, the direct contact of the sample solution with the heater 3 is avoided by the use of the thin plate 5 and the damage consumption of the heater 3 can be suppressed.