首页> 外国专利> Extended epoxy resins based on cyclohexen-1-yl methylene diphenol or bicyclo(2.2.1)hepten-1-yl diphenol derivatives

Extended epoxy resins based on cyclohexen-1-yl methylene diphenol or bicyclo(2.2.1)hepten-1-yl diphenol derivatives

机译:基于环己-1-基亚甲基双酚或双环(2.2.1)庚-1-基双酚衍生物的扩展环氧树脂

摘要

The invention relates to compounds of the formula I or II IMAGE (I) IMAGE +TR IMAGE IMAGE (II) IMAGE +TR IMAGE in which A is a radical IMAGE R1 is hydrogen or methyl, R2 is the radical of an aliphatic, cycloaliphatic, aromatic or araliphatic diol after both of the hydroxyl groups have been removed, R3, R4, R5 and R6 independently of one another are hydrogen, C1-C6alkyl, chlorine or bromine, R7 is a radical of the formula III, IV, V or VI IMAGE (III) IMAGE (IV) IMAGE (V) IMAGE (VI) R8, R10, R12 and R14 are hydrogen, C1-C6alkyl or phenyl, R9, R11, R13 and R15 are hydrogen or C1-C6alkyl and the average value of n (number average) is a number from 1 to 20, it being possible for the radicals R1 to R15, within a given molecule, to assume different meanings within the scope of the definitions given. These compounds or also the epoxidized intermediates of the formula X IMAGE (X) IMAGE in which R1 to R3 are defined above and R7 is a radical of the formula IV or VI can be processed to give cured products having a high glass transition temperature and a low tendency to discoloration.
机译:本发明涉及式I或II的化合物。[式](I)<图像> + TR <图像> <图像>(II)<图像> + TR <图像>其中A为基团<图像> R1为氢或甲基,R 2是两个羟基都被除去后的脂族,脂环族,芳族或芳脂族二醇的基团,R 3,R 4,R 5和R 6彼此独立地是氢,C 1 -C 6烷基,氯或溴, R 7为式III,IV,V或VI的基团。[IMAGE](III)(IV)(V)(VI)R8,R10,R12和R14为氢,C1- C 6烷基或苯基,R 9,R 11,R 13和R 15为氢或C 1 -C 6烷基,n的平均值(数均)为1至20的数,基团R1至R15在给定分子内,在给定的定义范围内采用不同的含义。可以加工这些化合物或式X X的环氧化中间体,其中R 1至R 3定义如上,R 7为式IV或VI的基团,得到具有高玻璃化度的固化产物。转变温度和低变色趋势。

著录项

  • 公开/公告号EP0278900A3

    专利类型

  • 公开/公告日1991-07-17

    原文格式PDF

  • 申请/专利权人 CIBA-GEIGY AG;

    申请/专利号EP19880810038

  • 发明设计人 ROTH MARTIN DR.;MONNIER CHARLES E. DR.;

    申请日1988-01-25

  • 分类号C08G59/06;

  • 国家 EP

  • 入库时间 2022-08-22 05:53:48

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