首页> 外国专利> METHOD OF OPTIMIZING A CONDUCTOR-PATH LAYOUT FOR THE PRINTING HEAD OF AN INK PRINTING DEVICE, AND A CONDUCTOR-PATH LAYOUT FOR SUCHA PRINTING HEAD

METHOD OF OPTIMIZING A CONDUCTOR-PATH LAYOUT FOR THE PRINTING HEAD OF AN INK PRINTING DEVICE, AND A CONDUCTOR-PATH LAYOUT FOR SUCHA PRINTING HEAD

机译:用于油墨印刷设备的印刷头的导体路径布局的优化方法和用于这种印刷头的导体路径布局的方法

摘要

Through a suitable dimensioning of a transition structure (UV) of a configuration of conductor patterns provided on a thin film substrate (DS) connecting the plotted closely spaced conductors between them (LA) in the heating elements of the area (HR) to conductive traces having a broad gap between them (LB) in the connecting contact area is obtained a conductive tracings feed resistor (Li) which is as uniform as possible, while remaining as small as possible for all heating elements (RH). To this end, it is provided a design limitation that, for predetermined input variables, namely, the widths of conductive traces (da, db) and the gap widths (Sa, Sb) in both zones and slit width (Sv) of the transition structure (UV), provides as output variables, the width of conductors (dv) in the transition structure (UV).
机译:通过适当设置在薄膜基板(DS)上的导体图案结构的过渡结构(UV)的尺寸,将在区域(HR)的加热元件中在导体(LA)之间绘制的紧密间隔的导体连接到导电迹线在连接接触区域中在它们之间(LB)之间具有较大间隙的情况下,获得了导电迹线馈送电阻器(Li),该引线尽可能均匀,同时对于所有加热元件(RH)保持尽可能小。为此,提供了一种设计限制,即对于预定的输入变量,即导电迹线的宽度(da,db)和两个区域中的间隙宽度(Sa,Sb)和过渡的缝隙宽度(Sv)结构(UV),提供过渡结构(UV)中导体的宽度(dv)作为输出变量。

著录项

  • 公开/公告号EP0448614A1

    专利类型

  • 公开/公告日1991-10-02

    原文格式PDF

  • 申请/专利权人 SIEMENS AKTIENGESELLSCHAFT;

    申请/专利号EP19900900866

  • 发明设计人 KAPPEL ANDREAS;

    申请日1989-12-12

  • 分类号B41J2/01;B41J2/05;B41J2/14;B41J2/145;B41J2/16;H05K1/02;H05K1/16;

  • 国家 EP

  • 入库时间 2022-08-22 05:52:27

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