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Film or stripe waveguide structure - with optical grating formed at waveguide edge face

机译:薄膜或条状波导结构-在波导边缘面上形成光栅

摘要

Prodn. of an optical grating (3) on the small edge face (100) of an optical film or stripe waveguide (1) is carried out using an etch mask (2) which covers the waveguide flat surface (10) and which has an edge (20) defining the edge face contour to be etched along the mask edge (20). The novelty is that the mask edge (20) has comb tooth-like projections (21) defining the grating (3) and that the masked waveguide surface (10) is etched with an etchant which only etches perpendicularly to this surface. Also claimed is a film or stripe waveguide structure in which an optical grating (3) is formed on a small waveguide edge face (100) running along a given line (8), the grating lines being defined by projecting ribs (31) and/or recessed grooves (32) which are vertical to the waveguide surface (10). The novelty is that the ribs (31) and/or grooves (32) have a rectangular profile. USE/ADVANTAGE - The process is useful for prodn. of wavelength multiplexers and demultiplexers. It combines the high resolution of holographic exposure with the alignment precision of mask exposure and employs only low cost technology.
机译:产品使用蚀刻掩模(2)对光栅(3)进行光学膜或条状波导(1)的小边缘表面(100)的蚀刻,该蚀刻掩模覆盖波导平面(10)并具有边缘( 20)定义沿掩模边缘(20)蚀刻的端面轮廓。新颖之处在于,掩模边缘(20)具有限定光栅(3)的梳齿状突起(21),并且被掩模的波导表面(10)被仅垂直于该表面蚀刻的蚀刻剂蚀刻。还要求保护一种膜或条状波导结构,其中在沿着给定线(8)延伸的小波导边缘面(100)上形成一个光栅(3),光栅线由凸肋(31)和/或或垂直于波导表面(10)的凹槽(32)。新颖之处在于,肋(31)和/或凹槽(32)具有矩形轮廓。使用/优势-该过程对产品很有用。波长复用器和解复用器。它结合了全息曝光的高分辨率和掩模曝光的对准精度,并且仅采用低成本技术。

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