DEPOSITION OF THALLIUM OXIDE FOR CONTROLLED THALLIUM SUPERCONDUCTOR FILM, AND CONSTITUTION OF REACTOR

摘要

PURPOSE: To manufacture a thallium and copper oxide-based high-temperature superconducting film on various substrates by providing a container having a large cavity for containing a substrate and a film, and providing this container with an opening part through which thallium can pass. CONSTITUTION: The container having a cavity 20 which is sufficiently large to contain a substrate and film is provided as the container of a reactor 10. The container has an opening part through which thallium can pass. For example, the reactor 10 is equipped with a top plate 12 and a base plate 14 which function as a susceptor. These plates 12 and 14 function as reproducible reactive substances, which are effective for controlling of the deposition temperature in a heat treatment and give a temperature gradient between a coating film 22 and a deposited film 16 which face it. Further, the cavity 20 is surrounded with a cap plate 22 and a spacer foil. Consequently, the thallium and copper oxide-based high-temperature superconducting film can be manufactured on various substrates.