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FORMATION OF DOUBLE LAYER FILM FOR ELECTRODEPOSITION COATING SUBSTRATE TO ALUMINUM OR ALUMINUM ALLOY
FORMATION OF DOUBLE LAYER FILM FOR ELECTRODEPOSITION COATING SUBSTRATE TO ALUMINUM OR ALUMINUM ALLOY
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机译:用于铝或铝合金的电沉积涂层基材的双层膜的形成
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摘要
PURPOSE:To obtain the electrodeposition coating substrate having excellent resistance to elution of Al and Cr by applying a specific amt. of a specific silica sol-contg. an org. high-polymer resin compsn. on a specific deposition of a chromate film formed on an Al or Al alloy surface, then drying the coating. CONSTITUTION:The chromate treating liquid contg. 5 to 90g/l total chromium ions is applied on the surface of the Al or Al alloy and is dried to form the chromate film layer of 10 to 150mg/m2 in terms of metal chromium. The above- mentioned treating liquid consists preferably of 3 to 50g/l Cr6+, 2 to 40g/l Cr3+, and 0.25 to 1.5 Cr3/Cr6+ and further, a specific ratio of PO + or silica sol may be incorporated therein. The org. high-polymer resin compsn. contg., by solid content, 0.2 to 1.2 silica sol having 10 to 500mum average grain size is applied on the above-mentioned chromate film and is dried to form 0.2 to 5g/m2 film. The double layer film for the electrodeposition coating substrate having the excellent resistance to the elution of the Al and Cr and the excellent corrosion resistance, coating adhesive property an coating appearance is formed in this way.
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机译:目的:通过施加特定的amt,获得具有优异的耐Al和Cr溶出性的电沉积涂料基材。特定的二氧化硅溶胶控制。一个组织。高聚物树脂组合物。在铝或铝合金表面上形成的铬酸盐膜的特定沉积层上,然后干燥涂层。组成:铬酸盐处理液(续)。将5至90g / l的总铬离子施加在Al或铝合金的表面上,并干燥以形成以金属铬计为10至150mg / m 2的铬酸盐膜层。上述处理液优选由3至50g / l Cr 6+,2至40g / l Cr 3+和0.25至1.5 Cr 3 / Cr 6+组成,此外,可以在其中掺入一定比例的PO +或硅溶胶。组织。高聚物树脂组合物。相对于固体成分,将平均粒径为10〜500μm的0.2〜1.2的硅溶胶涂布在上述铬酸盐膜上,使其干燥,形成0.2〜5g / m 2的膜。以这种方式形成了具有优异的耐Al和Cr的溶出性以及优异的耐腐蚀性,涂膜粘合性和涂膜外观的电沉积涂膜用双层膜。
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