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MANUFACTURE OF AL-TA BASED ALLOY TARGET PLATE MATERIAL FOR SPUTTERING
MANUFACTURE OF AL-TA BASED ALLOY TARGET PLATE MATERIAL FOR SPUTTERING
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机译:基于Al-TA的合金靶板材料的制备
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摘要
PURPOSE:To reduce slitting, crack and segregation by using a vertical mold fitting a tapered heat radiation plate. CONSTITUTION:In the mold for finishing a molten metal to an ingot-shape after vacuum-melting Al alloy containing Ta (0.5-10.0atm%), the vertical mold fitting the tapered heat radiation plate 3 is used. By this method, Al-Ta based sputtering target having less splitting, crack and segregation is obtd.
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