Method and device for the power supply, in the treatment gas, of a reactor located in a zone which is subjected to the electrical fields and / or intense genesis

摘要

The device according to the invention serves to supply, in the treatment gas, an ion implanter 1 isolated from its environment by an enclosure which is electrically conductive 3 connected to earth. These gases are supplied by the intermediate capacitors c1, c2 placed permanently inside the enclosure 3 and filled with a periodic manner on the basis of the gas sources 10, 11 disposed on the outside, by virtue of the ducts 14, 14 ′, at least in part, which pass through the insulating enclosure 3. Each phase of filling of the capacitors c1, c2, which is carried out during the periods of interruption of the implantation apparatus 1 is followed by a discharge phase of the gases in said ducts 14, 14 ′. / p & & p & the invention makes it possible to avoid the problems relating to the replacement of the gas cylinders disposed inside the chamber in conventional installations.